首先, 将AlN陶瓷表面金属化后分别切割成10mm×10mm×1.0mm、12mm×12mm×1.0mm及15mm×15mm×1.0mm的方块, 嵌入环氧树脂中制备成FR4/AlN复合材料; 然后, 利用SMT工艺将同款LED灯珠与上述内置三种不同尺寸AlN的复合基板材料组装成LED模组; 最后, 利用结温测试仪与半导体制冷温控台对三种LED模组分别进行了结温测试。同时, 结合热仿真手段对复合材料水平面的温度分布情况进行了模拟研究。结果表明: 上述三种尺寸陶瓷片对应LED的结温分别为96.95、92.94与91.81℃。热仿真结果显示, 陶瓷片尺寸通过界面热阻对扩散热阻产生影响, 增大陶瓷片尺寸有助于降低扩散热阻, 进而改善FR4/AlN复合材料的整体散热性能。

探讨光敏剂锌酞菁体外光动力疗法（ZnPc-PDT）抗肿瘤细胞的量效关系，为合理使用ZnPc提供参考。采用人脑胶质瘤细胞（U87 MG细胞）作为研究对象，用噻唑蓝(MTT)实验考察细胞存活率。采用单一变量的研究方法，分别考察了ZnPc浓度、激光功率密度、光照时间、体系氧含量和组织厚度等参量与U87 MG细胞存活率的关系。利用1,3-二苯基苯并呋喃(DPBF)和DCFH-DA活性氧探针分别检测了ZnPc-PDT过程中单线态氧的产量，并通过倒置显微镜观察经ZnPc-PDT治疗后的细胞形态和死亡细胞比例。结果表明，随着参量设置的变化，ZnPc-PDT对U87 MG细胞的杀伤力具有差异，通过调节参量，可达到较好的ZnPc-PDT治疗效果。

为提高离子束溅射制备 1 064 nm、532 nm双波长增透膜抗激光损伤阈值, 分别在靠近基板、空气侧加镀一定厚度二氧化硅膜层, 研究缓冲层、保护层对增透膜抗激光损伤阈值的影响。依据 ISO21254-2损伤测试标准, 测试不同膜系结构增透膜抗 1 064 nm波长激光损伤阈值。实验结果表明, 二氧化硅缓冲层提高增透膜抗激光损伤阈值约 65.4%；二氧化硅保护层提高增透膜抗激光损伤阈值约 66.7%；同时加镀缓冲层、保护层增透膜抗激光损伤阈值显著提高约 119%。

An approach for determining the optical constants of the weakly absorbing substrate is developed and applied to obtain the parameters of CaF2 and fused silica substrates in deep ultraviolet (DUV) and vacuum ultraviolet (VUV) range. A method for extracting the optical constants of thin films deposited on strongly absorbing substrate, which is based on the reflectance spectra measured at different angles of incidence, is also presented. The optical constants are determined by fitting the measured spectra to the theoretical models. The proposed method is applied to determine the refractive index and extinction coefficient (n, k) of MgF2 film deposited on silicon substrate by electron beam evaporation with substrate temperature 300 oC and deposition rate 0.2 nm/s. The determined n, k values at 193 nm are 1.433 and 9.1 \times 10-4, respectively.

The single- and multi-shot damage behaviors of HfO2/SiO2 high-reflecting (HR) coatings under Nd:YAG laser exposure were investigated. Fundamental aspects of multi-shot laser damage, such as the instability due to pulse-to-pulse accumulation of absorption defect and structural defect effect, and the mechanism of laser induced defect generation, are considered. It was found in multi-shot damage, the main factors influencing laser-induced damage threshold (LIDT) are accumulation of irreversible changes of structural defects and thermal stress that induced by thermal density fluctuations.

The laser-induced damage behavior of narrow-band interference filters was investigated with a Nd:YAG laser at 1064 nm under single-pulse mode and free-running laser mode. The absorption measurement of such coatings has been performed by surface thermal lensing (STL) technique. The relationship between damage morphology and absorption under the two different laser modes was studied in detail. The explanation was given by the standing-wave distribution theory.

Using a new kind of EH1000 ion source, hafnium dioxide (HfO2) films are deposited with different deposition techniques and different conditions. The absorbance and the laser damage threshold of these films have been measured and studied. By comparing these characteristics, one can conclude that under right conditions, such as high partial pressure of oxygen and right kind of ion source, the ion-assisted reaction deposition can prepare HfO2 films with higher laser induced damage threshold.